Lossless layout image compression algorithms for electron-beam direct-write lithography
نویسندگان
چکیده
منابع مشابه
Lossless Layout Image Compression Algorithms for Electron-Beam Direct-Write Lithography
Electron-beam direct-write (EBDW) lithography systems must in the future transmit terabits of information per second to be viable for commercial semiconductor manufacturing. Lossless layout image compression algorithms with high decoding throughputs and modest decoding resources are tools to address the data transfer portion of the throughput problem. The earlier lossless layout image compressi...
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Conventional photolithography systems use physical masks which are expensive and difficult to create and cannot be used forever. Electron BeamDirectWrite (EBDW) lithography systems are a noteworthy alternative which do not need physical masks [Chokshi et al. (1999)]. As shown in Figure 1 they rely on an array of lithography writers to directly write a mask image on a photo-resist coated wafer u...
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Future lithography systems must produce microchips with smaller feature sizes, while maintaining throughputs comparable to those of today’s optical lithography systems. This places stringent constraints on the effective data throughput of any maskless lithography system. In recent years, we have developed a datapath architecture for directwrite lithography systems, and have shown that compressi...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
سال: 2015
ISSN: 2166-2746,2166-2754
DOI: 10.1116/1.4927639